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Silicide formation for Ni and Pd bilayers on Si (100) substrates
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Double threshold behaviour of I-V characteristics of CoSi2/Si Schottky contacts.
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A BEEM study on the effects of the annealing temperature on barrier height inhomogeneity of CoSi2/Si contact formed in Co-Ti-Si systems.
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Surface and interface morphology of CoSi2 films formed by multilayer solid-state reaction.
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Sillicide formation for Ni and Pd bilayers on Si(100) substrates
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CoSi2 formation through SiO2
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Electrical characterization of Ar-ion-bombardment-induced damage in Au/Si and PtSi/Si Schottky barrier contacts.
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CoSi2 nucleation in the presence of Ge.
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Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer.
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Orientation-dependent stress build-up during the formation of epitaxial CoSi2.