Philippe Vereecken

Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers

Ruben Blomme (UGent) , Rahul Ramesh (UGent) , Lowie Henderick (UGent) , Matthias Minjauw (UGent) , Philippe Vereecken, Mieke Adriaens (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2024) NANOTECHNOLOGY. 35(23).

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Journal Article
A1
open access

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries

Lowie Henderick (UGent) , Ruben Blomme (UGent) , Matthias Minjauw (UGent) , Jonas Keukelier (UGent) , Johan Meersschaut, Jolien Dendooven (UGent) , Philippe Vereecken and Christophe Detavernier (UGent)

(2022) DALTON TRANSACTIONS. 51(5). p.2059-2067

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Conference Paper
C3
open access

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

Lowie Henderick (UGent) , Hamid Hamed, Felix Mattelaer (UGent) , Matthias Minjauw (UGent) , Momo Safari, Philippe Vereecken and Christophe Detavernier (UGent)

(2020) AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts.

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Journal Article
A2
open access

A USB-controlled potentiostat/galvanostat for thin-film battery characterization

Thomas Dobbelaere (UGent) , Philippe Vereecken and Christophe Detavernier (UGent)

(2017) HARDWAREX. 2. p.34-49

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Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed

Katrien Strubbe (UGent) , Philippe Vereecken and Walter Gomes

(1999) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 146(4). p.1412-1420

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PhD Thesis

Elektrochemische reductie van koperionen aan galliumarsenide-éénkristallen en eigenschappen van de gevormde GaAs/Cu-fasegrenzen

Philippe Vereecken

(1998)

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Electrochemical reduction vs, vapour deposition for n-GaAs/Cu Schottky-barrier formation : a comparative study

Philippe Vereecken, GM VANALME, Roland Vanmeirhaeghe (UGent) , Felix Cardon and Walter Gomes

(1996) JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS. 92(20). p.4069-4075

Academic Bibliography

Philippe Vereecken

Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

A USB-controlled potentiostat/galvanostat for thin-film battery characterization

Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed

Elektrochemische reductie van koperionen aan galliumarsenide-éénkristallen en eigenschappen van de gevormde GaAs/Cu-fasegrenzen

Electrochemical reduction vs, vapour deposition for n-GaAs/Cu Schottky-barrier formation : a comparative study

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