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0000-0003-3796-0024
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Photoquenching-by-photocharging : a single process of failure of oxygen-exposed InP/ZnSe quantum dots
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- Journal Article
- A1
- open access
Fast, in situ gas analysis during atomic layer deposition through optical emission spectroscopy and non-negative matrix factorization
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Whodunit : EPR unmasks a process-of-failure in InP/ZnSe QDs
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- Journal Article
- A1
- open access
Atomic layer deposition of boron-containing layers using a combined trimethylborate- and water-based plasma
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Atomic layer deposition for stable on-chip quantum dot LEDs : hybrid quantum dot pockets
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- Journal Article
- A1
- open access
Atomic layer deposition for stable InP-based on-chip quantum dot microLEDs : hybrid quantum dot pockets
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HfO2 area-selective atomic layer deposition with a carbon-free inhibition layer
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Molecular layer deposition of polyhydroquinone thin films for Li‐ion battery applications
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Enhanced growth in atomic layer deposition of ruthenium metal : the role of surface diffusion and nucleation sites
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Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography