Academic Bibliography

Search 200 years of publications by Ghent University researchers.

Koen Strijckmans

Faculty of Sciences > Department of Solid state sciences

ORCID iD: 0000-0002-7651-9461

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- Journal Article
- open access
Floating potential probes for process control during reactive magnetron sputtering

Josja Van Bever (UGent) , P. Vašina, R. Drevet, Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2024) Surface and Coatings Technology. 494.
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- Journal Article
- A1
- open access
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

Josja Van Bever (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2023) APPLIED SURFACE SCIENCE. 613.
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- Journal Article
- A1
- open access
A computational study of the double hysteresis phenomenon during reactive sputtering

Josja Van Bever (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2022) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 55(35).
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Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

Diederik Depla (UGent) , Robin Dedoncker and Koen Strijckmans (UGent)

(2021) THIN SOLID FILMS. 732.
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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Roeland Schelfhout, Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2020) SURFACE & COATINGS TECHNOLOGY. 399.
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- Journal Article
- A1
- open access
Modeling reactive magnetron sputtering : opportunities and challenges

Diederik Depla (UGent) , Koen Strijckmans (UGent) , Dulmaa Altangerel, Florian Cougnon, Robin Dedoncker, Roeland Schelfhout, Isabella Schramm (UGent) , Filip Moens and Roger De Gryse (UGent)

(2019) THIN SOLID FILMS. 688.
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- Conference Paper
- C3
- open access
The (in)stability of process control mechanisms in reactive DC sputtering deposition

Koen Strijckmans (UGent) , Roeland Schelfhout and Diederik Depla (UGent)

(2018) Plasma Surface Engineering, 16th International conference, Abstracts.
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Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout and Diederik Depla (UGent)

(2018) JOURNAL OF APPLIED PHYSICS. 124(24).
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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Roeland Schelfhout, Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) SURFACE & COATINGS TECHNOLOGY. 353. p.231-236
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Anomalous effects in the aluminum oxide sputtering yield

Roeland Schelfhout, Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 51(15).

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