Elisabeth Levrau

Conference Paper
C3
open access

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie Vandenbroucke (UGent) , Elisabeth Levrau, Matthias Minjauw (UGent) , Michiel Van Daele, Eduardo Solano Minuesa (UGent) , Rita Vos, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts.

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Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie Vandenbroucke (UGent) , Elisabeth Levrau, Matthias Minjauw (UGent) , Michiel Van Daele, Eduardo Solano Minuesa (UGent) , Rita Vos, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) PHYSICAL CHEMISTRY CHEMICAL PHYSICS. 22(17). p.9262-9271

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Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Sofie Vandenbroucke (UGent) , Elisabeth Levrau, Matthias Minjauw (UGent) , Kevin Van de Kerckhove, Kilian Devloo-Casier (UGent) , Sreeprasanth Pulinthanathu Sree, Johan A Martens, Rita Vos, Karolien Jans, Jolien Dendooven (UGent) , et al.

(2019) EuroCVD 22 - Baltic ALD 16, Conference abstracts.

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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Yiting Sun, Elisabeth Levrau, Liping Zhang, Jef Geypen, Johan Meersschaut, Alexis Franquet, Quoc Le Le, Jean-François de Marneffe, Hugo Bender, Herbert Struyf, et al.

(2015) MICROELECTRONIC ENGINEERING. 137. p.70-74

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Journal Article
A1
open access

Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas

Teju Tunde Olawumi, Elisabeth Levrau, Mikhail Krishtab, Christophe Detavernier (UGent) , Johann W Bartha, Kaidong Xu, Frederic Lazzarino and Mikhail R Baklanov

(2015) ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. 4(1). p.N3048-N3057

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In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD

Elisabeth Levrau, Kevin Van de Kerckhove, Kilian Devloo-Casier (UGent) , Sreeprasanth Pulinthanathu Sree, Johan A Martens, Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2014) JOURNAL OF PHYSICAL CHEMISTRY C. 118(51). p.29854-29859

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Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Elisabeth Levrau, Kilian Devloo-Casier (UGent) , Jolien Dendooven (UGent) , Karl F Ludwig, Patrick Verdonck, Johan Meersschaut, Mikhail R Baklanov and Christophe Detavernier (UGent)

(2013) LANGMUIR. 29(39). p.12284-12289

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Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties

Frederik Goethals (UGent) , Elisabeth Levrau, Glenn Pollefeyt (UGent) , Mikhail R Baklanov, Ivan Ciofi, Kris Vanstreels, Christophe Detavernier (UGent) , Isabel Van Driessche (UGent) and Pascal Van Der Voort (UGent)

(2013) JOURNAL OF MATERIALS CHEMISTRY C. 1(25). p.3961-3966

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Journal Article
A1
open access

Pore narrowing of mesoporous silica materials

Frederik Goethals (UGent) , Elisabeth Levrau, Els De Canck (UGent) , Mikhail R Baklanov, Christophe Detavernier (UGent) , Isabel Van Driessche (UGent) and Pascal Van Der Voort (UGent)

(2013) MATERIALS. 6(2). p.570-579

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Journal Article
A1
open access

Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator

Nebiyu Adello Yebo (UGent) , Sreeprasanth Pulinthanathu Sree, Elisabeth Levrau, Christophe Detavernier (UGent) , Zeger Hens (UGent) , Johan A Martens and Roel Baets (UGent)

(2012) OPTICS EXPRESS. 20(11). p.11855-11862

Academic Bibliography

Elisabeth Levrau

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas

In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD

Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties

Pore narrowing of mesoporous silica materials

Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator

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