Roeland Schelfhout
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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering
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- Journal Article
- A1
- open access
Modeling reactive magnetron sputtering : opportunities and challenges
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- Conference Paper
- C3
- open access
The (in)stability of process control mechanisms in reactive DC sputtering deposition
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Tutorial: Hysteresis during the reactive magnetron sputtering process
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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering
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Anomalous effects in the aluminum oxide sputtering yield
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- Conference Paper
- C3
- open access
Reactive (HiPIMS) through the eyes of a 'simple' model
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- Conference Paper
- C3
- open access
On the cause of a double hysteresis during reactive magnetron sputtering
(2017) -
- Journal Article
- A1
- open access
The existence of a double S-shaped process curve during reactive magnetron sputtering
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Hysteresis behavior during facing target magnetron sputtering
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- Conference Paper
- C3
- open access
Highlights in modeling the reactive magnetron sputtering process with RSD2013
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On the target surface cleanness during magnetron sputtering
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On the target surface cleanness during magnetron sputtering