- ORCID iD
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0000-0003-3620-8949
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Understanding How the Interfacial Properties of ALD‐Crafted In<sub>2</sub>S<sub>3</sub> Thin Films Promote Enhanced Formate Electrosynthesis
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- Journal Article
- open access
Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor
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Vapour phase deposition of phosphonate-containing alumina thin films using dimethyl vinylphosphonate as precursor
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Atomic layer deposition of lithium borate and lithium borophosphate for lithium-ion batteries
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Chemical triggers behind Pt nanoparticle growth during post-deposition O2 annealing by in situ near-ambient pressure X-ray photoelectron spectroscopy
(2024) -
- Conference Paper
- open access
Catalyst on Top? Importance of the Final Layer of an ALD Deposited Catalyst. Ni-Fe Catalysts Deposited by ALD
(2024) -
- Journal Article
- A1
- open access
Optimization of non-alloyed backside ohmic contacts to N-face GaN for fully vertical GaN-on-silicon-based power devices
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In vacuo XPS study on Pt growth by atomic layer deposition using MeCpPtMe3 and N2/NH3 plasma
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Role of the oxidizing co-reactant in Pt growth by atomic layer deposition using MeCpPtMe3 and O2/O3/O2-plasma
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- Journal Article
- A1
- open access
Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers