- Work address
-
Krijgslaan 281, S1
9000 Gent - Geert.Rampelberg@UGent.be
- ORCID iD
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0000-0002-7746-0721
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- Conference Paper
- C3
- open access
Atomic layer deposition of yttrium oxide films and their properties of water wettability
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Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability
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Atomic layer deposition of vanadium oxides : process and application review
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- Conference Paper
- C3
- open access
Cost-reducing PE-ALD processes for pure and doped SiO2 thin films
(2019) -
- Journal Article
- A1
- open access
Corrosion protection of Cu by atomic layer deposition
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Stabilizing fluoride phosphors : surface modification by atomic layer deposition
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- Conference Paper
- C3
- open access
Stabilizing red fluoride phosphors for white LEDs using atomic layer deposition
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- Conference Paper
- C3
- open access
Surface treatment of fluoride phosphors using atomic layer deposition
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- Conference Paper
- C3
- open access
Cost-reducing PE-ALD processes for pure and doped SiO2 thin films
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Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study