- ORCID iD
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0000-0002-7746-0721
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- Journal Article
- A1
- open access
Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreduction
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- Conference Paper
- C3
- open access
Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction
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- Conference Paper
- C3
- open access
Atomic layer deposition of yttrium oxide films and their properties of water wettability
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Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability
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Atomic layer deposition of vanadium oxides : process and application review
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- Conference Paper
- C3
- open access
Cost-reducing PE-ALD processes for pure and doped SiO2 thin films
(2019) -
- Journal Article
- A1
- open access
Corrosion protection of Cu by atomic layer deposition
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Stabilizing fluoride phosphors : surface modification by atomic layer deposition
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- Conference Paper
- C3
- open access
Stabilizing red fluoride phosphors for white LEDs using atomic layer deposition
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- Conference Paper
- C3
- open access
Surface treatment of fluoride phosphors using atomic layer deposition