ir. Boris Capon
No current affiliation with UGent
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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
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Formation of CuInSe2 films from metal sulfide and selenide precursor nanocrystals by gas-phase selenization, an in-situ XRD study
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Se-containing inks for the formation of CuInSe2 films without gas-phase selenization
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Plasma enhanced atomic layer deposition of ruthenium below 100°C using RuO4 and H2-plasma
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Low temperature thermal and plasma enhanced atomic layer deposition of ruthenium using RuO4 and H2/H2-plasma
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Antimony sulfide as a light absorber in highly ordered, coaxial nanocylindrical arrays: preparation and integration into a photovoltaic device
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Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H-2-plasma
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Se-Containing inks for the formation of CuInSe2 films without gas-phase selenization
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Atomic layer deposition of ruthenium at 100 °C using the RuO4-precursor and H2