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On the target surface cleanness during magnetron sputtering
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High entropy alloy thin films deposited by magnetron sputtering of powder targets
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Influence of Al doping on the bandgap of TiOx
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Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts
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- PhD Thesis
- open access
Key aspects of sputtering illustrated by the use of multi-element powder mixtures
(2013) -
- Journal Article
- A1
- open access
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
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- Conference Paper
- C3
- open access
Indium iron tin oxide: a cheap solution for ITO?
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Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study
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Fundamental aspects of home made targets for magnetron sputtering
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- Conference Paper
- C3
- open access
Powder mixtures as deposition targets for multicomponent thin films: a case study