- Work address
-
Sint-Pietersnieuwstraat 25, Rect.2
9000 Gent - Jakob.Kuhs@UGent.be
Show
Sort by
-
Atomic layer deposition of metal sulphides for the embedding of colloidal quantum dots
(2020) -
In situ photoluminescence of colloidal quantum dots during gas exposure : the role of water and reactive atomic layer deposition precursors
-
- Journal Article
- A1
- open access
Micro-Transfer-Printing of Al2O3-Capped Short-Wave-Infrared PbS Quantum Dot Photoconductors
-
- Journal Article
- A1
- open access
Plasma enhanced atomic layer deposition of gallium sulfide thin films
-
- Journal Article
- A1
- open access
Ligand binding to copper nanocrystals : amines and carboxylic acids and the role of surface oxides
-
Plasma enhanced atomic layer deposition of aluminum sulfide thin films
-
Plasma enhanced atomic layer deposition of aluminium sulphide
-
Plasma enhanced atomic layer deposition of aluminium sulphide
-
- Journal Article
- A1
- open access
Plasma enhanced atomic layer deposition of zinc sulfide thin films
-
Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures