Jakob Kuhs

Department of Solid state sciences

work address

Krijgslaan 281, S1
9000 Gent

email

Jakob.Kuhs@UGent.be

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2017
- C3
- conference
Plasma enhanced atomic layer deposition of aluminium sulphide
Jakob Kuhs UGent, Zeger Hens UGent and Christophe Detavernier UGent (2017) EuroCVD-21 - Baltic ALD-15, Joint meeting, Abstracts. Mark
- C3
- conference
Plasma enhanced atomic layer deposition of aluminium sulphide
Jakob Kuhs UGent, Zeger Hens UGent and Christophe Detavernier UGent (2017) Atomic Layer Deposition, 17th International conference, Abstracts. Mark
- A1
- journalArticle
Plasma enhanced atomic layer deposition of zinc sulfide thin films
Jakob Kuhs UGent, Thomas Dobbelaere UGent, Zeger Hens UGent and Christophe Detavernier UGent (2017) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 35(1). Mark
2016
- C3
- conference
Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
Matthias Minjauw UGent, Jolien Dendooven UGent, Boris Capon, Christian Dussarat, Eduardo Solano Minuesa UGent, Kilian Devloo-Casier, Jakob Kuhs UGent, Marc Schaekers, Alessandro Coati and Christophe Detavernier UGent (2016) SR-ALD workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain). Mark
- C3
- conference
Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
Matthias Minjauw UGent, Jolien Dendooven UGent, Boris Capon, Christian Dussarat, Eduardo Solano Minuesa UGent, Kilian Devloo-Casier, Jakob Kuhs UGent, Marc Schaekers, Alessandro Coati and Christophe Detavernier UGent (2016) Belgian Physical Society, General scientific meeting, Abstracts. Mark
- C3
- conference
Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
Matthias Minjauw UGent, Jolien Dendooven UGent, Christian Dussarat, Eduardo Solano Minuesa UGent, Kilian Devloo-Casier, Jakob Kuhs UGent, Marc Schaekers, Alessandro Coati and Christophe Detavernier UGent (2016) Materials for Advanced Metallization, IEEE conference, Abstracts. Mark
- C3
- conference
Plasma enhanced atomic layer deposition of zinc sulfide
Jakob Kuhs UGent, Zeger Hens UGent and Christophe Detavernier UGent (2016) Atomic Layer Deposition, 16th International conference, Abstracts. Mark